Tom Cecil, Senior Architect at Synopsys, will give a public talk on June 10 2024 at 4 pm in room U014 of OMZ (INF 350, floor -1)’

Title: Inverse Lithography Technology

Abstract: As Moore’s law has continually marched forward, shrinking chip designs in an exponential manner, there has been a corresponding progression on the chip manufacturing side. This progression has led to increasingly strong and complex diffraction effects during imaging which must be overcome to print chip designs accurately at the smallest, <10nm design nodes. In this talk, we will discuss some of the techniques developed to keep pace including the computational lithography forward and inverse problem frameworks. We will also discuss some newer areas of research including machine learning and GPU usage.